High vacuum multitarget magnetron sputtering and electron beam evaporation composite coating

Description

Model

Specification

Usage

Other

High vacuum multi-target magnetron sputtering and electron beam evaporation composite coating machine

CK&ZF-500

Main pumping pump: single-stage molecular pump

Ultimate cacuuum:6x10^-9Pa

Sputtering chamber:φ500 x450

Target：4xφ76

样品：平面φ50；柱状：φ5 x5 x9只

Sample heated temperature：200℃

Sample transmission:Revolted and rotated

Gas flow  system:4-MFC,

进口4坩埚电子枪，功率6KW

计算机自动控制

Used for the production of metal

 films,medium films,semiconduct

 or films and metal films

Suitable for scientific research.

Simultaneous ion beam assisted magnetron sputtering