Multi-target magnetron sputtering equipment DB-450

Description

Model

Specification

Usage

Other

Magnetron

Sputtering

Equipment

DB-450

Ultimate cacuuum:7x10^-5Pa

Sputtering chamber:φ450x350

Target：4xφ76

Sample size:φ50x4个

Sample heated temperature：500℃

Sputtering power: RF 1000W；DC200W 

Sample transmission:Revolted and rotated

Gas flow  system:3-MFC,

Used for the production of metal

 films,medium films,semiconduct

 or films and metal films

Suitable for scientific research.

Process computer control