Multitarget magnetron sputtering equipment DB-500

Description

Model

Specification

Usage

Other

Magnetron

Sputtering

Equipment

DB-500

Ultimate cacuuum:8x10^-5Pa

Sputtering chamber:φ500

Target：3xφ60

Sample size:φ50

Sample heated temperature：400℃

Sputtering power: RF 1000W

Sample transmission:Revolted and rotated

Gas flow  system:2-MFC,

Flow control

lon beam source auxiliary

Used for the production of metal

 films,medium films,semiconduct

 or films and metal films

Suitable for scientific research.